Karl Suss MA6 Operating Manual
Also see for MA6: Operating manual
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NANOSYSTEM FABRICATION FACILITY (NFF), HKUSTVersion 1.1 Page 19 of 244.11 Wafer AlignmentThere are 3 adjustment knobs located near the bottom of the stage to move waferrelative to the mask, X, Y and R (rotation).CAUTION: If mask and wafer are in contact mode (Contact indicator on), don’t alignthe wafer.1. With MA6 in alignment mode, and view in split field mode (if wafers alreadyhave a pattern), straighten wafer by turning rotation R knob.2. Rotate X and Y alignment knobs to align substrate alignment mark centralsymmetrical to the mask alignment mark.3. If too much resistance is felt during wafer movement, or alignment gap needs tobe changed, press “SEP ^” key to decrease separation (z value on displaybecome less negative) or “SEP v” key to increase separation (z value becomesmore negative.4. When properly aligned, pressing “ALIGNMENT CHECK” key LED on tobring the substrate into contact mode. If wafer has patterned, alignment shift dueto contact may be observed through microscope. If unacceptable shift isobserved, substrate or mask may need to be re-cleaned.Note: The “ALIGNMENT CHECK” key is not available for proximity or softEmergency Off Button Transport SlideSTG-X-Movement Micrometer ScrewSTG-Y-Movement Micrometer ScrewSTG-Q-Movement Micrometer ScrewMain Power switchWafer Chuck |
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