Q150T Sample Preparation SystemQ150T - Instruction Manual 31 10473 - Issue 55.3 Metal EvaporationThis process is designed for the following applications: Alternative coatings methods for SEM samples where sputtering is not available. Coating metal films on Non EM substrates.It is only available with Q150T E/ES models equipped with the optional metalevaporation insert. To achieve a specific coating depth, the FTM must be installed.5.3.1 How to achieve a 20nm gold coatingFit the tungsten filament to the evaporation insert as described on page 59.Load the filament with a small quantity of the gold to be evaporated. Carefully fit theinsert as described on page 58.1. Create a new profile based on Metal evaporation.2. Edit the new profile: Change the material from Carbon to Gold. Change outgas time to a minimum of 2 seconds Set the outgas current to 0 (out gassing is not necessary for this material).3. Ensure the FTM cover is open4. Run the new profile.5. When the Pump Hold window is displayed, tap Continue when ready to proceed.6. When the evaporate window is displayed use either the right arrows or the slider toincrease the requested current gradually until evaporation can be seen on the filmthickness monitor display. The measured current may differ from the requestedcurrent at this point due to changes in impedance of the source while the metal ismelting.Figure 5-1. QT Metal evaporation process7. When the required thickness of 20nm is achieved, tap the Z button to the left handside and the current will immediately reduce to zero.
